Mechanical properties of ITO (Sn-doped indium oxide) layer on PET (polyethylene terephthalate) substrates, such as abrasion resistance, peel strength of ITO layer and touch panel durability were improved by the action of organosilicon layer as undercoat. Auger electron depth profile revealed that outer side of organosilicon layer changed into silica-like phase, whereas inner side of it remained as it was after ITO layer deposition. Since silica-like part had an affinity to ITO layer and organosilicon part had an affinity to carbonyl groups of PET, it clung to both ITO layer and PET firmly. Mechanical properties were improved by the betterment of adhesion of ITO layer to PET.

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The aim of this paper is to prepare and characterize the free radical photopolymer with carbon black nano-particles. At first, carbon black nano-powder was wetted by the co-solvent composed from propylene glycol mono-methyl ether acetate with normal butyl alcohol lowing surface tension to enhance the permeability of agglomerated carbon black, and then polymeric dispersant was added to stable carbon black nano-particles in liquid after milling process. The dispersed solution was taken out to blend with cresol novolac epoxy acrylate, dipentaerythritol penta-hexa-acrylate, ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-3-yl]-, 1-(o-acetyle oxime), and 2-benzl-2-N, N-dimenthylamino-1- (4-morpho-linophenyl) butanone to form the free radical type photosensitive resin with carbon black nano-particles. In order to understand the state of the carbon black nano-particle dispersion in the solution and photosensitive resin, respectively, the dynamic laser light scattering particle analyzer, transmission electron microscopy, Brunauer-Emmett-Teller, and atomic force microscopy were applied. Additionally, polymerizing quantification and lithographic performance of photosensitive resin with carbon black nano-particle were carried out by differential photo calorimeter and wedge curve analysis, respectively, in this study.

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We designed novel acrylate monomers with an alicyclic lactone group [3-oxa-4-oxotricyclo[5.3.1.0^6,10]undecanyl (OTCU) or 4,4-dimethyl-5-oxa-6-oxo tetracyclo[7.2.1.0^2,8.0^3,7]dodecyl (OTCD) group] for an ArF chemically amplified resist. The polymers with these monomer units exhibited high transparency at 193 nm and good adhesion to a Si substrate. They were also extremely durable against dry etching. The etching durability of polymer with the OTCD group was superior to that of the polymer with the OTCU group. Furthermore, a chemically amplified positive resist comprised of terpolymer with an OTCD units and a photo-acid generator achieved a resolution of 130-nm L/S with an ArF exposure system.

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Under UV light irradiation with a medium pressure mercury lamp at 313 nm, a gaseous mixture of butyl azide (BAz) and acrolein (AC) produced sedimentary aerosol particles only. The nucleation process during aerosol particle formation was investigated by measuring the He-Ne laser light intensity scattered by the aerosol particles formed under light irradiation at 313 nm. The induction period to detect scattered light became longer with increasing partial pressure of BAz of up to 5 Torr and then became shorter with increasing partial pressure of BAz at above 10 Torr, showing that the photochemical reactions of BAz of lower than 5 Torr decelerated the nucleation reaction of AC molecules whereas those of BAz at above 10 Torr accelerated the nucleation reaction. The chemical process during aerosol particle formation was studied by measuring the FT-IR and GC-MS spectra of the gaseous mixture after UV light irradiation. The results showed that chemical reactions of BAz took place in different ways depending on the partial pressure of BAz, and butyl nitrene and butyl radicals originating from BAz were incorporated into the nucleation and propagation processes of the aerosol particles.

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Chemically amplified systems, which provide improved sensitivity, are composed of a polymer matrix resin and small molecule photoacid generating units. The inherent discrepancies of the physical and chemical properties of these components can lead to phase separation thereby reducing resolution and sensitivity. Incorporating the PAG in the polymer main chain provides a unified system, which alleviates these problems. Furthermore, PAG incorporated in the chain may improve outgassing and acid diffusion control. Incorporated in the polymer chain was phenylmethacrylate dimethylsufonium triflate photoacid generator (Tf-PAG), which upon exposure generates triflic acid, providing the level of sensitivity required by chemical amplification (CA) systems. 2-Ethyl-2-adamantyl methacrylate (EAMA), and 3-hydroxy-1-adamantyl methacrylate (HAMA) served as the protecting group. (-Butyrolactone methacrylate (GBLMA) provided necessary substrate adhesion. PAGs bound in the main chain resist were exposed with the ASML PAS 5500/950B 193 nm Step and Scan System, with 0.63 NA. Resolution of 110nm line space (220 pitch) and 80 nm isolated lines, with photospeed of 8.2 mJ/cm² and 2.5 mJ/cm² respectively, were obtained for these PAG in the chain resists.

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We have reported the spectroscopic properties of pyridine compounds in solid states or highly concentrated composites. They are much different from usual diluted solutions. Such highly concentrated circumstances cause molecular interactions between pyridine derivatives and their neighbor molecules. We determined luminescence spectra of such materials at cryogenic temperature. Comparisons between 2-substituted pyridines and 4-substituted pyridines are discussed. Some alkyl-substituted pyridiniums were also examined for comparison with polymeric compounds.

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