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Volume 23 (2010)
- Issue 6 Pages 757-
- Issue 5 Pages 605-
- Issue 4 Pages 459-
- Issue 3 Pages 301-
- Issue 2 Pages 145-
- Issue 1 Pages 3-
Volume 23, Issue 6
Displaying 1-7 of 7 articles from this issue
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Oksana V. Sakhono, Joachim Stumpe, Leonid M. Goldenberg, Tatiana N. Sm ...2010 Volume 23 Issue 6 Pages 757-764
Published: December 27, 2010
Released on J-STAGE: January 07, 2011
JOURNAL FREE ACCESSOrganic-inorganic nanocomposites consisted of photocurable acrylate monomers and inorganic nanoparticles (NP) suitable for the fabrication of diffractive optical elements (DOE) by holographic exposure have been developed. Via capping of the NP surface with proper organic ligands the problem of NP aggregation in organic matrix was avoided. Using the NP of different nature and properties (metal oxides, phosphates, semiconductors and noble metals), the photopolymer materials for efficient holographic DOE as well as for specific optical and photonic elements can be designed. Dependence of diffractive and optical properties of the gratings on the material formulation and on exposure conditions are shown.View full abstractDownload PDF (764K) -
Milena De Brito, Francois Courtecuisse, Xavier Allonas, Celine Croutxe ...2010 Volume 23 Issue 6 Pages 765-769
Published: December 27, 2010
Released on J-STAGE: January 07, 2011
JOURNAL FREE ACCESSDownload PDF (670K) -
M. Sakho, X. Allonas, C. Ley2010 Volume 23 Issue 6 Pages 771-774
Published: December 27, 2010
Released on J-STAGE: January 07, 2011
JOURNAL FREE ACCESSWe evaluated the influence of sensitizers on the reactivity of a thianthrenium salt. Calculating the difference in free energy shows that the decomposition of the salt occurs through electron transfer mechanism. Photopolymerization efficiency was evaluated using real-time RTIR, showing that the sensitization process is effective and that its efficiency is governed by the photoinduced electron transfer reaction.View full abstractDownload PDF (560K) -
Tomoyuki Yuba, Ryoji Okuda, Masao Tomikawa, Jae Hyun Kim2010 Volume 23 Issue 6 Pages 775-779
Published: December 27, 2010
Released on J-STAGE: January 07, 2011
JOURNAL FREE ACCESSWe investigated the soft baking condition effect on residual solvent amount, decomposition of photo sensitive diazonaphthoquinone group, photosensitivity, and development loss amount of positive photosensitive polyimide, which composed of partial esterified poly(amic acid) and photosensitive diazonaphthoquinone sulfonate. After soft baking, 10-14% of solvent was remained. Below 120°C baking, the naphthoquinone group was remained more than 90%. More than 40% of the naphthoquinone group was decomposed when 130°C baking. Photosensitivity seems to be determined by development loss of photosensitive polyimide. 120°C for 4min is suitable soft baking condition in this study.View full abstractDownload PDF (337K) -
Daisuke Matsukawa, Haruyuki Okamura, Masamitsu Shirai2010 Volume 23 Issue 6 Pages 781-787
Published: December 27, 2010
Released on J-STAGE: January 07, 2011
JOURNAL FREE ACCESSReworkable dimethacrylate which has adamantyl moiety and hemiacetal ester moiety in a molecule was synthesized. UV curing and photo-induced degradation of the UV cured resins were investigated. On UV irradiation at 365 nm, dimethacrylate containing 2,2-dimethoxy-2-phenylacetophenone and di(4-tert-butylphenyl)iodonium triflate became insoluble in methanol. The UV cured resin degraded under acidic conditions. Present resins were applied to UV nanoimprint lithography (UV-NIL) using 365 nm-light and fine line/space patterns on quartz plate were obtained. These patterns (primary patterns) were used as a mold for making a replicated resin mold. By using the primary patterns as a mold, multifunctional acrylates were UV imprinted on Si substrate. After acids were generated in the primary patterns by baking or UV exposure at 254 nm, the sample was dipped in methanol to remove the primary patterns and a replicated resin mold was obtained on Si substrate. UV-NIL using the replicated mold was successfully accomplished.View full abstractDownload PDF (722K) -
Koji Takahashi, Yuuki Takanashi, Shiki Yagai, Akihide Kitamura, Takash ...2010 Volume 23 Issue 6 Pages 789-794
Published: December 27, 2010
Released on J-STAGE: January 07, 2011
JOURNAL FREE ACCESSDianthrylsilanes composed of two 9-anthryl groups and permethyloligosilane (n = 1, 2 or 3) chain units were prepared (A2S1, A2S2, and A2S3). Photochemical intramolecular cyclization reactions of these compounds were studied in solution and in PMMA spin coated film. In cyclohexane solution, the A2Sn molecules gave one of three cycloadducts, depending on the chain length of the A2Sn molecules. We also demonstrate the fabrication of fluorescent images using cycloaddition reactions in PMMA film.View full abstractDownload PDF (907K) -
Koji Nozaki2010 Volume 23 Issue 6 Pages 795-801
Published: December 27, 2010
Released on J-STAGE: January 07, 2011
JOURNAL FREE ACCESSThe development of alicyclic methacrylate-based polymers has provided many opportunities for the design of new dry and immersion 193-nm resists, and their high etching resistance and transparent properties are appealing to resist chemists. The discovery of adamantanes marked a critical turning point, and the development of poly (2-methyl-2-adamantyl methacrylate-co-mevalonic lactone methacrylate)-based 193-nm resist enabled establishment of practical non-aromatic resist materials. This paper reviews our research and development.View full abstractDownload PDF (2301K)
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