巻号一覧
25 巻 (2012)
- 6 号 p. 699-
- 5 号 p. 559-
- 4 号 p. 409-
- 3 号 p. 261-
- 2 号 p. 131-
- 1 号 p. 3-
25 巻, 6 号
選択された号の論文の10件中1～10を表示しています
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Ken’ichi Koseki, Kensuke Otsuka, Kyoung-Mo Jeong2012 年 25 巻 6 号 p. 699-704
発行日: 2012/12/20
公開日: 2013/01/25
ジャーナル フリーThe present time, ink-jet technology has been spread out in wide-ranging fields because it is capable of setting the required functional materials on the necessary location. UV-curable jet ink that environmentally friendly and dry immediately, has been used for industrial printing such as a wide format printer. It is expected to print various non-porous surfaces. But it is difficult to design the ink formulation having good adhesive strength on the whole ones. Basically, the ink makes it possible to adhere to the non-porous surface by optimizing the parameter of interfacial chemistry. But, enough adhesive strength could not be obtained frequently. In this study, it was examined that adhesive property of radical polymerization type UV-curable jet ink included hydrogen abstraction type photo-initiator, while we expected that the strong adhesive strength existed between the ink and non-porous surface. As a result, it was possible strongly to adhere to the PET film by less amount of chemical reaction of monomers comparing with use of cleavage type photo-initiator. It is clear that a strong bonding strength generates from photo-induced graft polymerization.抄録全体を表示PDF形式でダウンロード (323K) -
Chung-Min Ryu, Bei-Li Pang, Ji-Ho Han, Hyung-Il Kim2012 年 25 巻 6 号 p. 705-712
発行日: 2012/12/20
公開日: 2013/01/25
ジャーナル フリーPhoto-crosslinkable acrylic copolymer pressure-sensitive adhesives (PSAs) have many applications in the process of electronic industry. As the silicon wafers become thinner, PSAs need to show proper adhesion performance and better debonding characteristics. The acrylic copolymers were prepared with 2-ethylhexyl acrylate, ethyl acrylate, and acrylic acid by radical solution polymerization followed by chemical modification with glycidyl methacrylate to have the photo-crosslinkable groups in the side chains. The adhesion properties of photo-crosslinked acrylic copolymer PSAs were much dependent on both the content of glycidyl methacrylate and the UV dose which played a crucial role in the extent of crosslinking. The clean debonding of PSAs from silicon wafer surface was easily obtained by effective photo-crosslinking of acrylic copolymers modified with glycidyl methacrylate into fully crosslinked networks resulting from controlling the extent of crosslink and the adhesion strength of photo-crosslinked acrylic copolymer.抄録全体を表示PDF形式でダウンロード (873K) -
Byoung-chan Bae, Na Kun2012 年 25 巻 6 号 p. 713-718
発行日: 2012/12/20
公開日: 2013/01/25
ジャーナル フリーPolymeric PS nano-drugs (chlorin e6 conjugate with acetylated hyaluronic acid and chlorin e6 conjugate with acetylated chondroitin sulfate; NPSs) were synthesized via carbodiimide reaction as nano-scale drugs for long term photodynamic therapy. The samples were self-assembled with average sizes below 200 nm. Their self-photoquenching properties in the aqueous phase were observed, while fluorescence intensity was strongly correlated with the amount of Ce6 in the organic solvent dimethyl sulfoxide (DMSO). In vitro phototoxicities of the NPSs are similar with free Ce6 measured by 3-[4,5-dimethylthiazol-2- yl]-2,5-diphenyltetrazolium bromide (MTT) assay. The self-quenching effect and fluorescence recovery of NPSs were determined using KODAK imagestation. Compared with free Ce6, NPSs were retained at the tumor region due to their self-aggregate property. Also, in vivo tumor suppression effect was maintained until 10 days. These results suggest that the NPSs can give new idea for long term therapy in the clinical application of photodynamic therapy.抄録全体を表示PDF形式でダウンロード (492K) -
Yuta Noguchi, Akira Kawai2012 年 25 巻 6 号 p. 719-722
発行日: 2012/12/20
公開日: 2013/01/25
ジャーナル フリーBiopotential is important and sensitive information in order to monitor and control growth condition for living cells. For detecting biopotential change accurately, a stable biocompatible polymer film is required. In this study, a stable surface of a SU-8 film is characterized, and it is possible for applying to a cover material of electrode surface or an element of a biological implanted device. Surface potential VSU-8 of a SU-8 film is measured by making a metallic electrode contact. As a standard equilibrium, VSU-8 indicates exponential decreasing to reach at +21mV. Biopotential Vbio of plant cells indicates large potential change for 10 to 42mV range. This potential change means an individualistic signal of living cells. By combination of a SU-8 film and living cells, it is capable of obtaining accurate and effective data.抄録全体を表示PDF形式でダウンロード (286K) -
Yusuke Sakurai, Akira Kawai2012 年 25 巻 6 号 p. 723-727
発行日: 2012/12/20
公開日: 2013/01/25
ジャーナル フリーDirect Methanol Fuel Cell (DMFC) consists of a perflurosulfonic acid (PFSA) electrolyte is attractive as a portable power source. It is possible to fabricate a DMFC array by dividing a PFSA film into micro pieces by photolithography. In this regard, it is known that photoresist film causes significant compressive and tensile stress generation in an underlying layer. Then it is needed to control preparation condition of photoresist film formed on a PFSA film. The effect of compressive load in a PFSA film is observed as enhancement of electro motive force. By applying compressive load to a PFSA film, proton ionic conductivity would be enhanced. On the other hand, a tensile load acts to decrease electro motive force. Therefore photoresist pattern shape should be designd effectively in order to enhance proton ionic conductivity of PFSA film.抄録全体を表示PDF形式でダウンロード (333K) -
Takashi Aiba, Akira Kawai2012 年 25 巻 6 号 p. 729-733
発行日: 2012/12/20
公開日: 2013/01/25
ジャーナル フリーDPAT (Direct Peeling by using AFM tip) method provides direct measurement of a peeling force of micro-structure. A peeling force of micro polymer pattern at different peeling height is analyzed. When a cantilever is made a contact with a bottom of pattern, peeling force and displacement of cantilever are larger than in those of pattern top. The cantilever motion is analyzed peeling phenomena in different peel height. The peeling force of pattern is determined to around 1μN. The peeling force applying at pattern bottom reflects the adhesion force. The effectivity and accuracy of the DPAT method is discussed.抄録全体を表示PDF形式でダウンロード (680K) -
Shunya Horii, Keisuke Yamane, Haruyuki Okamura, Masamitsu Shirai2012 年 25 巻 6 号 p. 735-740
発行日: 2012/12/20
公開日: 2013/01/25
ジャーナル フリーSeveral types of photoacid- and photobase-generating monomers were prepared. These monomers were cured with multi-functional acrylate monomers by irradiation at 365 nm. The surface of the cured resin was exposed to 254nm light to generate hydrophilic surface. Water contact angles of the resin surface having acid units (-SO3H or -COOH) and amine units (-NH2) were 25-36° and 38-43°, respectively, depending on the resin composition. A mold for UV imprint lithography (UV-IL) was prepared using the cured resin with hydrophilic surface. It was shown that the resin mold could be used for UV-IL without surface treatment using demolding agents.抄録全体を表示PDF形式でダウンロード (145K) -
Tomosumi Kamimura, Hiroki Muraoka, Yuki Yamana, Yoshiaki Matsura, Hide ...2012 年 25 巻 6 号 p. 741-746
発行日: 2012/12/20
公開日: 2013/01/25
ジャーナル フリーLaser resist stripping (1) for the positive-tone diazonaphthoquinone (2) / novolak resist (3) was successful without an occurring the laser damage (5) to a Si wafer (6). The fundamental (1064 nm) of pulsed Nd:YAG laser irradiation (4) in the water can improve the resist stripping effect as compared with that of atmosphere irradiation. In the case of the laser irradiation in water, the heat that occurred at Si wafer surface reaches the water on the resist surface across a thin resist layer. The effect of this heat occurs at the interface between resist surface and the water. By momentary cubical expansion of the water at the resist surface, the resist catches the pressure from water. The water on the resist surface will be worked like a wall rejecting a pressure. The resist stripping effect in the water condition was thought to improve by both thermal expansion of the Si wafer and pressure from the water. And also, a laser irradiation of 532 nm having large photon energy was found to be higher resist stripping efficiency than that of the wavelength 1064 nm.抄録全体を表示PDF形式でダウンロード (212K) -
Hiroaki Kawata, Junya Ishihara, Toshiaki Tanabe, Masaaki Yasuda, Yoshi ...2012 年 25 巻 6 号 p. 747-750
発行日: 2012/12/26
公開日: 2013/01/25
ジャーナル フリーThe demolding forces for various molds are studied for thermal imprint process. Molds are fabricated by anisotropic KOH etching of (110) Si wafer and conventional plasma etching. Although the side wall roughness by the KOH etching is much smaller than that by the plasma etching, the demolding forces for the both molds are similar. The demolding forces for the molds with various cavity depths are measured, and it is found that the demolding force depends on the total side wall area. The demolding force for the mold with line and space pattern is about 50 times as large as that for the mold with no patterns. These results show that the demolding force from the side wall is dominant in the thermal imprint process.
Author’s name of paper 25_223 (2012) was error. The paper should be replaced to the authors shown here.抄録全体を表示PDF形式でダウンロード (249K) -
Mitsuo Takase, Shunichi Sugimoto, Kazuki Nakamura, Norihisa Kobayashi2012 年 25 巻 6 号 p. 751
発行日: 2012/12/26
公開日: 2013/01/25
ジャーナル フリーPdf file of J. Photopolym. Sci. Technol. 25 (3) 261-265 (2012) has been in error.Top label of P261 in pdf should be changed from “197-206” to “261-265”, as shown here (25_751.pdf). We ask you to replace 25_261.pdf by 25_761.pdf attached here.
Electrochemiluminescence(ECL) is known as electrochemical reaction exhibiting emission, and is applicable to new imaging device. We have been studying the Emission characteristics of ECL cell containing a Ruthenium(II) complex as luminescent species. The emission turn-on response time and emission intensity were dramatically improved by introducing AC method. In this paper, we studied the phenomena of ECL cell with electroconductive polymer like as poly [2-methoxy-5- (2-ethylhexyloxy)-1,4-phenylenevinylen] (MEH-PPV) instead of a Ruthenium (II) complex. Orange light emitted from the ECL cell of MEH-PPV with a turn-on voltage of AC 4V at 10Hz for the first time.抄録全体を表示PDF形式でダウンロード (344K)
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