Seikei-Kakou
Online ISSN : 1883-7417
Print ISSN : 0915-4027
ISSN-L : 0915-4027
Volume 21, Issue 6
Displaying 1-17 of 17 articles from this issue
Index
Preface
Technical Notes : Special Issue on Polymer Processing in Sports Gears
Special Lecture-Fabrication Techniques Improving Product Function-Bonding, Welding, Multilayer and Other Processes-
Technical Report
Report from Universities and Institusions in Japan : 170
Report from Overseas
Reports of International Meeting
Topic on Products and Technologies
Original Papers
  • Kunio Sakauchi, Tomoaki Takebe, Hideki Uehara, Toshiro Yamada, Toshita ...
    2009Volume 21Issue 6 Pages 336-345
    Published: 2009
    Released on J-STAGE: January 06, 2010
    JOURNAL FREE ACCESS
    Stretched film of ethylene random copolypropylene (r-PP) is widely used for heat shrinkable film. The content of copolymerized ethylene is selected in accordance with use. In this paper, the influence of annealing conditions on dimensional stability and heat shrinkage was reported for the stretched film of r-PP produced by double bubble tubular machine.
    From this research, the prediction formula was derived by multiple linear regression analysis, and as a result the setting guideline of annealing conditions was proposed in order to design a heat shrinkable film of r-PP with good dimensional stability and the required heat shrinkage.
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  • Ken-ichi Machinaga, Jun Taniguchi, Noriyuki Unno, Nobuji Sakai, Takesh ...
    2009Volume 21Issue 6 Pages 346-350
    Published: 2009
    Released on J-STAGE: January 06, 2010
    JOURNAL FREE ACCESS
    Ultra-violet (UV)-nanoimprint lithography (NIL) has some uncertain phenomena such as filling behavior, release property and so on. Grasping of these phenomena is very important to avoid replication errors such as filling shortage, uniformity replication and so on. To observe the filling phenomena, hollow grid structure molds were applied to UV-NIL, and relationship filling behavior and effect of release coating was observed. The hollow grid structure molds were fabricated using electron beam lithography (EBL) and hydrogen silsesquioxane (HSQ). Fabrication process was as follows; First, EBL was carried out with high acceleration voltage (30 kV). Next, EBL was vertically carried out with low acceleration voltage (3 kV). Finally, resist was developed by tetramethyl ammonium hydroxide (TMAH). In order to observe the filling phenomena, UV-NIL was carried out using obtained hollow grid structure molds in atmospheric pressure. Some hollow grid structure molds were coated with the release agent (Optool DSX 0.1 %). UV photo-curable resin PAK-01 was dispensed onto the hollow grid structure molds. The NIL conditions were 0.6 MPa, 0.9 MPa and 1.2 MPa in transfer pressure. The surface energy of the mold with the release agent is smaller than the mold without the release agent. As a result, without release agent, the mold was completely filled by PAK-01 at 0.6 MPa, 0.9 MPa and 1.2 MPa. With release agent, the mold was not filled in at 0.6 MPa and 0.9 MPa. The mold was completely filled in at only 1.2 MPa. Consequently, UV-NIL with the release coated mold, which has a fine pattern (under 500 nm) needs high pressure (over 1.2 MPa) in transfer pattern to fill the resin to the mold pattern.
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