Ultra-violet (UV)-nanoimprint lithography (NIL) has some uncertain phenomena such as filling behavior, release property and so on. Grasping of these phenomena is very important to avoid replication errors such as filling shortage, uniformity replication and so on. To observe the filling phenomena, hollow grid structure molds were applied to UV-NIL, and relationship filling behavior and effect of release coating was observed. The hollow grid structure molds were fabricated using electron beam lithography (EBL) and hydrogen silsesquioxane (HSQ). Fabrication process was as follows; First, EBL was carried out with high acceleration voltage (30 kV). Next, EBL was vertically carried out with low acceleration voltage (3 kV). Finally, resist was developed by tetramethyl ammonium hydroxide (TMAH). In order to observe the filling phenomena, UV-NIL was carried out using obtained hollow grid structure molds in atmospheric pressure. Some hollow grid structure molds were coated with the release agent (Optool DSX 0.1 %). UV photo-curable resin PAK-01 was dispensed onto the hollow grid structure molds. The NIL conditions were 0.6 MPa, 0.9 MPa and 1.2 MPa in transfer pressure. The surface energy of the mold with the release agent is smaller than the mold without the release agent. As a result, without release agent, the mold was completely filled by PAK-01 at 0.6 MPa, 0.9 MPa and 1.2 MPa. With release agent, the mold was not filled in at 0.6 MPa and 0.9 MPa. The mold was completely filled in at only 1.2 MPa. Consequently, UV-NIL with the release coated mold, which has a fine pattern (under 500 nm) needs high pressure (over 1.2 MPa) in transfer pattern to fill the resin to the mold pattern.
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