The self-regulation of fluorosilicate concentration by the addition of K
+ to a chromium plating bath saturated with K
2SiF
6 was studied. The following results were obtained: (1) Since K
2SiF
6 is a strong acid salt, the solubility of K
2SiF
6 in low pH solution such as a chromium plating bath was not much higher than that in its aqueous solution. (2) The decrease in the solubility of K
2SiF
6 conforming to “common-ion effect” did not agree to the following dissociation. K
2-SiF
6→2K
++SiF
62-. (3) The reason was explained by the following hydrolysis of K
2SiF
6: K
2SiF
6+H
2O→2K
++SiF
5(OH)
2-+HF. The dissociation of a fluorosilicate having higher solubility such as Na
2Si F
6 was as follows: Na
2SiF
6→2Na
++SiF
62-. Whereas, the dissociation of a fluorosilicate having lower solubility such as BaSiF
6 was as follows: BaSiF
6+2H
2O→Ba
2++SiF
4(OH)
22-+2HF. The results of experiments well agreed with the basis of these dissociations. (4) For example, the solubility of K
2SiF
6 was 10g/
l in chromium plating bath containing 250g/
l of CrO
3 at 55°C. Therefore, the plating bath for selfregulating SiF
6 was prepared by the addition of a small amount of K
2CO
3 to the bath. The solubility of K
2SiF
6 was 7g/
l in low concentration chromium plating bath containing 50g/
l of CrO
3 at 55°C. Since the optimum concentration of K
2SiF
6 in this bath is 0.6g/
l, 27.5g/
l of K
2CO
3 shall be added to get the self-regulating bath. However, this composition was not adequate for the chromium plating bath owing to the increase of pH value.
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