巻号一覧
34 巻, 10 号
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不安定成長理論の現状と可能性青柿 良一, 牧野 徹1983 年 34 巻 10 号 p. 486-492
発行日: 1983/10/01
公開日: 2009/10/30
ジャーナル フリーWhen a metal surface is electrochemically deposited from an electrolyte solution, it is often found many minute crystllites appear. This is attributed to the surface fluctuation which exists in thermodynamic equilibrium between metal adatoms and ions near the surface. The process becomes clear, i.e., the microscopic fluctuation is allowed to grow by electrochemical reaction which is characteristic of an electrode system, developing to macroscopic crystal particles. In this paper, the possibility for controlling surface morphology in the surface treatment process is discussed and an example of the application of this theory to the measurement of the surface energy is represented.抄録全体を表示PDF形式でダウンロード (1894K) -
津留 壽昭, 小林 繁夫, 楠原 公規, 乾忠 孝1983 年 34 巻 10 号 p. 493-498
発行日: 1983/10/01
公開日: 2009/10/30
ジャーナル フリーThe mechanism of cathodic deposition of chromium from alcoholic solutions of CrCl3⋅6H2O was examined by using current controlled single pulse method. The rate of electrodeposition of chromium from alcoholic solutions of CrCl3⋅6H2O under current densities of approximately 0.6-6.0A/dm2 (MeOH), 0.5-6.5A/dm2 (EtOH), and 0.5-3.0A/dm2 (n-PrOH) was controlled by charge transfer reaction. The electrode kinetic parameters for chromium deposition were determined by means of potential decay technique. The following electrodeposition mechanism was inferred.
trans-[Cr(OH2)4Cl2]+……nX+H2O+e-→[Cr(OH2)5Cl]++Cl-+nX (nX: ROH molecules)
[Cr(OH2)5Cl]++2e-_??_Cr+Cl-+5H2O.
Eventually, the electrodeposition of chromium from dichlorotetraaquochromium (III) ion was concluded to proceed through the intermediate chloropentaaquochromium (II) ion.抄録全体を表示PDF形式でダウンロード (735K) -
神田 勝美, 西條 謹二1983 年 34 巻 10 号 p. 499-504
発行日: 1983/10/01
公開日: 2009/10/30
ジャーナル フリーEffects of plating variables on the composition of Zn-Co-Mo plating were investigated. The influence of additives such as CoSO4, (NH4)6Mo7O24 and (NH4)2SO4 in a plating bath was discussed with the aid of polarization measurment and ESCA. The results were summarized as follows: 1) The Co content of the deposit increased with the increase of CoSO4 and (NH4)6Mo7O24 in the solution, and the Mo content in the deposit also increased with increased amount of (NH4)6Mo7O24. With an increase of (NH4)2SO4 in the solution, both Co and Mo contents of the deposit decreased. 2) Increased current density caused an increase of the Co content in the deposit, however, Mo content decreased. Either increase in temperature or strong agitation caused the Co content to decrease, but the Mo content to increase conversely. 3) The effects of additives, current density, temperature and agitation of the bath on the formation of Zn-Co-Mo deposit may be attributed to the pH of the electolyte in the vicinity of cathode surface during plating.抄録全体を表示PDF形式でダウンロード (738K) -
山崎 恒博, 三宅 益市1983 年 34 巻 10 号 p. 505-509
発行日: 1983/10/01
公開日: 2009/10/30
ジャーナル フリーIn the steel-making industry, the descaling of stainless steel strip is normally made by pickling in a fused salt bath at a temperature of 400°C to 500°C, followed by electrolytic pickling in sulfuric acid or nitric acid, and pickling in a mixture of nitric acid and fluoric acid. A fused salt film (S.F.) method has been developed to replace the first step, or the pickling in the fused salt bath. In this method, an aqueous salt solution is sprayed on the surface of strip after annealing to form a fused salt film thereon. Water contained in the film is evaporated by heat retained in the strip. Our basic investigation showed that when Na2CO3-NaNO3 solutions were used, the S.F. method achieved nearly the same descaling effect as that of the conventional pickling in the fused salt bath. This suggests the possibility of eliminating the salt bath. For thin strips, it is basically possible to spray the aqueous solution before annealing.抄録全体を表示PDF形式でダウンロード (577K) -
目黒 真作, 伊勢 武一, 高木 修, 外島 忍1983 年 34 巻 10 号 p. 510-515
発行日: 1983/10/01
公開日: 2009/10/30
ジャーナル フリーNiO surface prepared by the thermal oxidation (720°C, in the air, 15min.) has the characteristic of a p-type semiconductor electrode of being photosensitive. This property appears more certainly when the substrate was plated with Ni before the thermal treatment, because of increasing of the effective surface area. It is estimated that the band gap of this NiO is over 3.54eV from the action spectrum of the cathodic photocurrent at the potential of 0.5V vs. Ag/AgCl, Cl-. The value of the photocurrent increased with the concentration of the oxidants added to the solution, but decreased in the case of the colored oxidants, probably because of the absorption of light in the shorter range of wave length. The value of the photocurrent ip is related to the intensity of light I1 by the Tributch's relation; ip∝I1/2·1The Mott-Schottky plots obtained from the value of differential capacitance showed a straight line in the region of -0.7-0.9V and the value of flatband potential was 0.85-0.95V vs. Ag/AgCl, Cl-. Furthermore the pH dependency of the flatband potential showed a well correlated straight line with a slope of -60mV/pH. The durability of this electrode against cathodic over polarization was superior to anodic, contrary to our expectations.抄録全体を表示PDF形式でダウンロード (2121K)
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