巻号一覧
36 巻, 12 号
選択された号の論文の17件中1～17を表示しています
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福田 安生, 土谷 康夫, 島 芳延, 寺坂 正二1985 年 36 巻 12 号 p. 494-500
発行日: 1985/12/01
公開日: 2009/10/30
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岡島 義昭1985 年 36 巻 12 号 p. 501-506
発行日: 1985/12/01
公開日: 2009/10/30
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田中 彰博1985 年 36 巻 12 号 p. 507-513
発行日: 1985/12/01
公開日: 2009/10/30
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加賀見 英世, 土井 清三1985 年 36 巻 12 号 p. 514-519
発行日: 1985/12/01
公開日: 2009/10/30
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黒崎 和夫1985 年 36 巻 12 号 p. 520-527
発行日: 1985/12/01
公開日: 2009/10/30
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市田 敏郎1985 年 36 巻 12 号 p. 528-534
発行日: 1985/12/01
公開日: 2009/10/30
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三木 哲郎, 二瓶 好正1985 年 36 巻 12 号 p. 535-541
発行日: 1985/12/01
公開日: 2009/10/30
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岡本 浜夫, 尾嶋 正治, 峰岸 延枝1985 年 36 巻 12 号 p. 542-548
発行日: 1985/12/01
公開日: 2009/10/30
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オージェ分析を中心として小林 郁朗1985 年 36 巻 12 号 p. 549-557
発行日: 1985/12/01
公開日: 2009/10/30
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北山 實1985 年 36 巻 12 号 p. 558-566
発行日: 1985/12/01
公開日: 2009/10/30
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橋本 明弘, 小林 正男, 渡辺 望, 佐久田 昌明1985 年 36 巻 12 号 p. 567-572
発行日: 1985/12/01
公開日: 2009/10/30
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渡辺 望, 小林 啓介, 成沢 忠, 中島 尚男1985 年 36 巻 12 号 p. 573-580
発行日: 1985/12/01
公開日: 2009/10/30
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金野 英隆, 永山 政一1985 年 36 巻 12 号 p. 581-586
発行日: 1985/12/01
公開日: 2009/10/30
ジャーナル フリーHydrogen-annealed 99.99% pure iron was anodized at 0.6V vs. SCE for 60min in a deaerated 0.15mol/l borate solution (pH=8.43). The in-depth profile of boron in the formed oxide film was determined by XPS combined with stepwise removal of the oxide by cathodic reduction. A mathematical function was introduced to obtain the real depth profile from the measured values. The profile was in good agreement with the one obtained by SIMS, though the result by SIMS was not quantitative. It was found that B (III) was distributed in the outer part of the film at an average B/Fe atomic ratio of 0.17-0.18, whereas little or no boron was detected by XPS in the inner part. The total amount of B (III) in the film was estimated to be 0.25mg/m2 or ca. 1.7mass%. These results demonstrate that, with a suitable film sectioning technique, it is possible to determine the distribution of ions in the depth direction by XPS even for oxide films with thicknesses as thin as the escape depth of photoelectrons.抄録全体を表示PDF形式でダウンロード (710K) -
熊谷 正夫, 内田 隆彦, 阿野 信二1985 年 36 巻 12 号 p. 587-591
発行日: 1985/12/01
公開日: 2009/10/30
ジャーナル フリーAuger electron spectroscopy (AES) analysis was performed on the surface films formed on mild steel during indoor simulation of open recirculating cooling water treatment process steps, namely, I) initial treatment, II) intermediate treatment, and III) maintenance treatment.
It was found that the basic structure of the films was formed by polyphosphate/zinc-based initial treatment (step I), and the films comprised four layers, P-rich, Ca-rich, Zn-rich and Fe-oxide from the solution side. The energy shift of the Auger spectra suggest that the main component of the P-rich layer was polyphosphate.
The basic structure of the films was not changed with phosphonate-based treatment through steps I to III. It is noteworthy that Fe species were absent from the P-rich layer through all steps of phosphonate-based treatment. It is therefore assumed that the outer P-rich layer replaced polyphosphate with phosphonate from step II to step III.
In the case of polymer-based (non-phosphorous) treatment, Fe ions appeared on the surface of the films along with a decrease in the P-rich layer at step II, and the outer layer changed from P-rich to Si-rich at step III. It is assumed that silicates in solution reacted with Fe ions on the surface of the films to form insoluble iron silicates.抄録全体を表示PDF形式でダウンロード (551K) -
瀬尾 眞浩, 佐藤 教男1985 年 36 巻 12 号 p. 592-595
発行日: 1985/12/01
公開日: 2009/10/30
ジャーナル フリーDepth profiles of anodic oxide films formed on niobium in 1mol·dm-3 phosphoric acid and sulfuric acid solutions were measured by simultaneous use of Auger electron spectroscopy and argon-ion sputter-etching. The penetration-depth, τp, of phosphorus in anodic oxide films formed in phosphoric acid was nearly half of the whole film thickness, τf. The penetration of sulfur in films formed in sulfuric acid, however, was negligible. The relative Auger peak-to-peak height (pph) of Nb (167eV)/Nb (197eV) changed with the relative Auger pph of O (510eV)/Nb (197eV) suggesting the possibility of state-analysis from the relative change in niobium Auger pph. The anodic oxide films were identified by comparison with the depth profile of a standard Nb2O5 film as consisting of a hydrous outerlayer and an anhydrous inner layer of Nb2O5. The degree of preferential sputtering of oxygen component from the Nb2O5 film decreased with increasing kinetic energy of the argon-ion beam.抄録全体を表示PDF形式でダウンロード (500K) -
松永 正久, 田中 彰博, 本間 禎一1985 年 36 巻 12 号 p. 596-601
発行日: 1985/12/01
公開日: 2009/10/30
ジャーナル フリーIt has been reported, that the thickness of oxides on Si or Al can be determined up to about 120Å, using Auger electron spectroscopy, without ion-milling depth profiling, by using the ratio of the chemically shifted and unshifted peaks from the oxide asd the substrate, respectively. These measurements can be difficult, however, when the resolution of the apparatus is insufficient. Calculation of the ratio by a micro-computer was carried out, and very good coincidence was obtained between the experimental and composed spectra. Film thicknesses are obtained more accurately by using the present method.抄録全体を表示PDF形式でダウンロード (554K) -
武井 たつ子1985 年 36 巻 12 号 p. 602-607
発行日: 1985/12/01
公開日: 2009/10/30
ジャーナル フリーThe mechanism of the electrocatalytic activity of SnO2-Si electrodes for the reduction of oxygen in alkaline solution was clarified by surface analysis of the electrodes by ESCA.
It was found that H2O2, which was formed by the reduction of oxygen, not merely catalytically self-decomposed, but reduced the electrode suface and was reoxidized to produce oxygen. When the surface of the electrode was coated uniformly with a minute amount of platinum, the electrocatalytic activity of the electrode for the reduction of oxygen was improved and ESCA surface analysis showed that this was because the valency of Sn on the electrode was fixed at the tetravalent state.
The detection of the elements and the comparison of their amounts on a very thin layer (less than 2μm) was analyzed by EDX.抄録全体を表示PDF形式でダウンロード (738K)
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