Journal of the Japan Society of Colour Material
Online ISSN : 1883-2199
Print ISSN : 0010-180X
ISSN-L : 0010-180X
Volume 73, Issue 1
Displaying 1-7 of 7 articles from this issue
  • Kenjiro TSUSOUCHI, Tetsuji OZAKI
    2000 Volume 73 Issue 1 Pages 2-6
    Published: January 20, 2000
    Released on J-STAGE: November 20, 2012
    JOURNAL FREE ACCESS
    The effect of polar groups in acrylic resins on their solubility and solubility parameter was studied with gas-liquid chromatography. The acrylic resins contained polar groups up to 20 mol% of carboxyl and hydroxyl groups were synthesized from ethyl acrylate, acrylic acid and, 2-hydroxyethyl acrylate.
    From the changes of specific retention volumes (Vg0) and weight fraction activity coefficients (γw) at infinite dilution, the solubility of acrlyic resins into ethanol and 2-propanol increased by the introduction of polar groups. The effect of carboxyl group on the solubility was higher than that of hyroxyl group. The solubility of the resins into benzene, methyl ethyl ketone, and ethyl acetate decreased slightly by introduction of polar groups.
    Solubility parameter (SP value) of acrylic resins, estimated from the heat of solution (-_??_HS), increased by the introduction of polar groups. The resin contained hydroxyl group showed higher SP value than that contained carboxly group.
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  • Effect of Sulfuric Acid Concentration on Etching Rate
    Kanji MORI, Kazuyuki TACHI, Masataka MURAMATSU
    2000 Volume 73 Issue 1 Pages 7-10
    Published: January 20, 2000
    Released on J-STAGE: November 20, 2012
    JOURNAL FREE ACCESS
    The effect of sulfuric acid concentration on the etching rate of acrylic-melamine coating films was studied. Acrylic -melamine coating films were immersed in 10-, 40- and 70-wt% sulfuric acid at 60°C for 15 min to 16 day. The weight loss of the films was measured and the films were analyzed with IR and elemental analyses. The etching rates estimated from the weight loss in the cases of 10- and 40-wt% sulfuric acid were more than 104 times lower than that in 70 wt%. This result means that the acid rain etching is practically caused by concentrated sulfuric acid of about 70 wt%. The reason for the very low etching rates in the cases of 10- and 40-wt% sulfuric acid was found to be due to the very low extraction rates of melamine resin. The extremely low extraction rates in these cases were assumed to be due to the very low solubilities of melamine resin in sulfuric acid of these lower concentrations.
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  • Sulfuric Acid Permeation Caused by Decomposition of Crosslink Structure
    Kanji MORI, Kazuyuki TACHI, Masataka MURAMATSU
    2000 Volume 73 Issue 1 Pages 11-15
    Published: January 20, 2000
    Released on J-STAGE: November 20, 2012
    JOURNAL FREE ACCESS
    The permeation of sulfuric acid into six kinds of acrylic-melamine coating films and the decomposition of crosslink structure were studied experimentally and with numerical simulations. The coating films, formulated with two kinds of acrylic resins and four kinds of melamine resins, were immersed in 70-wt% sulfuric acid for predetermined time. The acid permeation was examined with an electron probe microanalyzer. Melamine resins formed by the decomposition of the crosslink were determined by UV spectra of the acid phase. The decomposition of the crosslink was correlated with the extraction of the melamine resins by numerical simulations.
    The permeation rate of sulfuric acid into the coating film was different for each formulation. The acid in the coatings had no concentration gradient, and showed a distinct boundary. The extraction ratio of melamine resin (SM) was expressed by SM = at - b, where t is immersion time and both a and b are constants (a, b > 0). “b” in the equation was common to all coatings.
    Numerical simulations showed that b was proportional to the ratio of the acid permeation rate to the reaction constant of crosslink decomposition. This result means that the permeation of sulfuric acid molecules into acrylicmelamine coatings is caused not by Fickian diffusion but by the decomposition of crosslink structure.
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  • Hidenori OKUZAKI
    2000 Volume 73 Issue 1 Pages 16-21
    Published: January 20, 2000
    Released on J-STAGE: November 20, 2012
    JOURNAL FREE ACCESS
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  • Takanori NAKAYAMA
    2000 Volume 73 Issue 1 Pages 22-27
    Published: January 20, 2000
    Released on J-STAGE: November 20, 2012
    JOURNAL FREE ACCESS
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  • Jin MIZUGUCHI
    2000 Volume 73 Issue 1 Pages 28-34
    Published: January 20, 2000
    Released on J-STAGE: November 20, 2012
    JOURNAL FREE ACCESS
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  • Masahiro ADACHI
    2000 Volume 73 Issue 1 Pages 35-39
    Published: January 20, 2000
    Released on J-STAGE: November 20, 2012
    JOURNAL FREE ACCESS
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