Significant progress has been made in techniques of surface patterning over large areas; complex patterns of particles can be formed using predefined templates or soft lithography. Although these approaches are quite effective, the use of template-free self-organization processes becomes necessary to complement them as the required structure sizes become of the order of nanometers. The advantages of a self-organization technique are its simplicity, versatility, cost-effectiveness, and compatibility with heterogeneous integration processes.
In this paper, we present our recent results on the pattern formation of colloidal particles by using a template-free technique based on the self-organization of particles. Our technique can produce various patterns including stripes, dot arrays, grids, and Sierpinski triangles.
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