Carbonaceous thin films were prepared by plasma-assisted chemical vapor deposition from acetylene, argon and nitrogen trifluoride (NF
3). Resulting carbonaceous thin films were characterized by scanning electron microscope (SEM), Raman spectroscopy, and Auger electron spectroscopy (AES). SEM observation and Raman spectra revealed that surface morphology and crystallinity of carbonaceous thin films depended on the flow rate of NF
3 to a great extent. Carbonaceous thin films composed of fine particles were obtained at high flow rate of NF
3. It was considered that active fluorine atoms derived from NF
3 accelerated the carbon growth at vapor phase and influenced the surface morphology and crystallinity. Based on the result of AES measurement, fluorine atoms were not contained in resulting thin films. It is concluded that addition of NF
3 to plasma is good method for control the surface morphology and crystallinity of carbonaceous thin films without contamination by fluorine atoms.
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