Ultrapurewater is essentially used in wet processes of semiconductor manufacturing in order to rinse out impurities on wafers and to prepare chemical solutions for wafer cleaning. The quality requirement for the ultrapurewater is getting higher along with the advance of semiconductor devices. The quality load map with analytical control items, purification facilities and production system of the ultrapurewater are overviewed. The achievements in the technologies of reducing a trace amount of fine particles and metal impurities, which would particularly cause yield reductions by the wafer contaminations, are described. In addition, the recent works on hydrogen peroxide in the ultrapurewater is described as well.
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