Abstract
We report in situ measurements of the stress and clarify the contribution of stress-induced anisotropy to the magnetic anisotropy in Co/Pd multilayer films prepared by dc magnetron sputtering. Stress of a multilayer film was measured in situ during the deposition using a home-made optical displacement probe. The sensitivity of the displacement probe was 5.9μ V/Å and it turned out to be good enough to detect stress caused by deposition of a monoatomic-layer-thick Co and Pd. The stress-induced anisotropy is ranged between 1.9 × 106 erg/cm3 and 3.1 × 106 erg/cm3 in our samples. In comparison with contribution of the Néel's surface anisotropy, this magnetoelastic contribution to the perpendicular magnetic anisotropy is estimated from 40% ∼ 50%.
