AFM Tip Characterizer fabricated by Si/SiO2 multilayers

Hisataka Takenaka; Masatoshi Hatayama; Hisashi Ito; Tadayuki Ohchi; Akio Takano; Satoru Kurosawa; Hiroshi Itoh; Shingo Ichimura

doi:10.1380/ejssnt.2011.293

Conference -NSS-6-

AFM Tip Characterizer fabricated by Si/SiO₂ multilayers

Hisataka Takenaka, Masatoshi Hatayama, Hisashi Ito, Tadayuki Ohchi, Akio Takano, Satoru Kurosawa, Hiroshi Itoh, Shingo Ichimura

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Keywords: Atomic force microscopy, Tip characterizer, Multilayer, Si/SiO₂

JOURNAL FREE ACCESS

2011 Volume 9 Pages 293-296

DOI https://doi.org/10.1380/ejssnt.2011.293

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Abstract

An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to 131 nm was developed using Si/SiO₂ multilayers. This characterizer was constructed with isolated line structures and comb-shaped trench structures. The shape of a standard Si AFM tip was estimated using this characterizer. The result shows that this Si/SiO₂ multilayer-type tip characterizer has good potential for the characterization of AFM tips with a fine radius. [DOI: 10.1380/ejssnt.2011.293]

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