Magneto-optical spectroscopic scatterometry for analyzing patterned magnetic nanostructures

Roman Antos; Jan Mistrik; Tomuo Yamaguchi; Martin Veis; Eva Liskova; Stefan Visnovsky; Jaromir Pistora; Burkard Hillebrands; Sergej O. Demokritov; Takashi Kimura; Yoshichika Otani

doi:10.3379/jmsjmag.30.630

Contributed Paper

Magneto-optical spectroscopic scatterometry for analyzing patterned magnetic nanostructures

Roman Antos, Jan Mistrik, Tomuo Yamaguchi, Martin Veis, Eva Liskova, Stefan Visnovsky, Jaromir Pistora, Burkard Hillebrands, Sergej O. Demokritov, Takashi Kimura, Yoshichika Otani

Author information

Roman Antos
Frontier Research System, RIKEN
Jan Mistrik
Research Institute of Electronics, Shizuoka University
Tomuo Yamaguchi
Research Institute of Electronics, Shizuoka University
Martin Veis
Charles University, Faculty of Mathematics and Physics
Graduate School of Electronic Science and Technology, Shizuoka University
Eva Liskova
Charles University, Faculty of Mathematics and Physics
Stefan Visnovsky
Charles University, Faculty of Mathematics and Physics
Jaromir Pistora
VSB-Technical University of Ostrava
Burkard Hillebrands
Department of Physics, University of Kaiserslautern,
Sergej O. Demokritov
Institute of Applied Physics, Westfälische Wilhelms-University Münster
Takashi Kimura
Institute for Solid State Physics, University of Tokyo
Yoshichika Otani
Frontier Research System, RIKEN
Institute for Solid State Physics, University of Tokyo

Keywords: magneto-optics, spectroscopy, scatterometry, grating, diffraction, Kerr effect, line-edge roughness

JOURNAL OPEN ACCESS

2006 Volume 30 Issue 6_2 Pages 630-636

DOI https://doi.org/10.3379/jmsjmag.30.630

Details

Abstract

Methodology and selected applications of magneto-optical (MO) spectroscopic scatterometry (MOSS) are presented on various types of magnetic gratings made by lithographic patterning. Three types of theoretical models with different levels of accuracy are described in detail: a rigorous one, an analytical approximation, and a model mostly appropriate for real structures affected by line-edge roughness (LER). The MOSS approach, based on explaining diffracted MO Kerr effect measurements by simulations employing the mentioned models, is demonstrated as a technique highly sensitive to nanoscale features such as native oxide overlayers, as well as capable of determining the LER characteristic quantitatively. Further possibilities to study unsaturated magnetic structures and compositions of magnetic materials including imperfect deposition or aging processes are suggested.

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