Journal of The Adhesion Society of Japan
Online ISSN : 2187-4816
Print ISSN : 0916-4812
ISSN-L : 0916-4812
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Acid Diffusion at ArF Resist/Si-hardmask Interface
Haruyuki Okamura, Koki Miyama, Akikazu Matsumoto, Hiroyuki Wakayama, Makoto Nakajima
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Keywords: Diffusion, Interface, Photoacid generator, ArF Resist, Si-hardmask
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2015 Volume 51 Issue s1 Pages 332-335

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