(5) Surface and Interface Imaging with XPS and TOF-SIMS

Abstract

X-ray photoelectron spectroscopy（XPS） and time-of-flight secondary ion mass spectrometry（TOF-SIMS）are widely used surface analysis methods to determine chemical composition and chemical state of a solid surface. The combination of the surface imaging analysis and ion etching enables buried interface imaging and 3D imaging. Thanks to the increased sensitivity of the instruments, and the soft removal of organic substances using gas cluster ions（GCIB）, the surface（ imaging analysis） has been expanding rapidly in various fields. This review describes the principle and several surface and interface imaging application of XPS and TOF-SIMS.