Proceedings of Annual / Fall Meetings of Atomic Energy Society of Japan
2007 Fall Meeting
Session ID : C42
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Study on reaction mechanisms of chemically amplified EUV resists
*Takahiro Kozawa, Hiroaki Oizumi, Iwao Nishiyama, Seiichi Tagawa
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Keywords: EUV, Lithography, Chemically amplified resist, Reaction mechanism, Radiation chemistry
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Abstract
[in Japanese]
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© 2007 Atomic Energy Society of Japan
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