Host: The Institute of Image Electronics Engineers of Japan
Name : Proceedings of the44th Annual Conference of the Institute of Image Electronics Engineers of Japan 2016
Number : 44
Location : [in Japanese]
Date : June 18, 2016 - June 19, 2016
In this paper, we propose a method to objectively find plagiarism of logo using SIFT Features. SIFT feature is robust to the scale change, but the detection position of key point change by the image resolution. Proposed method makes it possible to allow detection of key points by arranging a plurality for simple logo which is difficult to detection of the key points.