Asian Pacific Confederation of Chemical Engineering congress program and abstracts
Asian Pacific Confederation of Chemical Engineers congress program and abstracts
Session ID : 1P-12-006
Conference information

Thin Palladium Film Deposition by a CVD Technique
Tomomitsu AkihaTakemi NambaNaotsugu Itoh
Author information
CONFERENCE PROCEEDINGS FREE ACCESS

Details
Abstract
A technique and equipment developed in this study is based on a chemical vapor deposition (CVD) under a forced flow, where since some pressure difference between the outside and the inside of the support tube is applied, the chemical vapor can enter the porous layer of the support and then decompose. Palladium acetate was used as palladium source. The tubular support made from α-alumina powder is porous and has an average pore diameter of 0.15µm. The CVD was carried out by heating according to a programed temperature under a regulated pressure. The palladium membrane thus obtained was as thin as 2- 4 m, and had a good H2/N2 selectivity exceeding 5000.
Content from these authors
© 2004 The Society of Chemical Engineers, Japan
Previous article Next article
feedback
Top