Novel Lift-off Resist Process for Sub-100nm lead width GMR Heads by using Si-containing Bi-layer Resist

Asian Pacific Confederation of Chemical Engineering congress program and abstracts

Asian Pacific Confederation of Chemical Engineers congress program and abstracts

Session ID : 3P-05-001

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Host: The Society of Chemical Engineers, Japan

Novel Lift-off Resist Process for Sub-100nm lead width GMR Heads by using Si-containing Bi-layer Resist

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