Abstract
Total-reflection X-ray fluorescence analysis (TXRF) has come into wide use for contamination control in the production of semiconductors. One of the problems in conducting quantification and cross-check experiments of TXRF is the issue of standard sample preparation. The signal intensity of TXRF greatly depends on the depth-profile of the analyte, and the depth-profile reproducibility of traditional standard sample preparation methods was sometimes not satisfactory. In this paper, a new standard sample preparation method that utilizes chemisorption in an alkaline hydrogen peroxide solution is presented. The method showed good reproducibility of the depth-profile as well as spatial and wafer-to-wafer uniformity. The standard wafers prepared by this method were actually applied for quantitative analysis and cross-check experiments, and the results were quite promising.
