Abstract
To improve the reliability of the analytical results of garnet epitaxial films by electron probe microanalysis (EPMA), the analytical conditions and sample preparing methods for plasma emission spectroscopy are discussed, and the deviation of analytical values between plasma emission spectroscopy and EPMA is compared. The chemical etching and sputtering methods are useful to separate the garnet epitaxial film from the gadolinium gallium garnet (GGG) substrate, and the epitaxial film with 1 1/4, inches diameter and 5 μm thickness can be analyzed by plasma emission spectroscopy. The coefficient of variation was 5%. The correction methods of EPMA analytical values are discussed. The optimal standard for gallium was GGG. The maximum deviation of the analytical values between plasma emission spectroscopy and EPMA was 3 wt.%.
