Automatic modeling of calculation processes of the shapes of the deposited films using software agent

Abstract

Chemical Vapor Deposition (CVD) is one of the most important ultra fine manufacturing processes for semiconductor devices. Although process simulators are very helpful for developing CVD processes, the huge calculation costs of the simulators limit their applications to various CVD processes. In our previous work, we showed that using models of the correlation between calculating conditions and calculated results with simulators (that is, modeling the calculation processes of the simulators) drastically decreases the calculation costs and extends the applicable area of the simulators. Therefore, we have developed an automatic modeling system for the calculation processes of a process simulator for CVD. The system consists of a software agent, generalized modeling software, Chemish and the simulator. The agent autonomously makes the models by operating the simulator and the modeling software. The models showed good predictability with the calculated results of the simulator. Because the simulator can be replaced with the models, the models will be used for the rapid research and development of the CVD processes.