実数値遺伝的アルゴリズムを用いたCVD装置における成膜速度分布の計算方法

高橋 崇宏; 高橋 和也; 河村 健; 長谷部 恭弘; 稲垣 妙香; 江間 義則

doi:10.11545/ciqs.2010.0.JP12.0

33th Symposium on Chemical Information and Computer Sciences, Tokushima

DOI https://doi.org/10.11545/ciqs.2010.0.JP12.0

Conference information

Host: Division of Chemical Information and Computer Science, The Chemical Society of Japan

Co-host: The Pharmaceutical Society of Japan, Japan Society for Bioscience, Biotechnology, and Agrochemistry, The Japan Society for Analytical Chemistry, Society of Computer Chemistry, Japan, Japanese Society for Information and Systems in Education (Approaval)

Poster Session

A calculation method of deposition profiles in CVD reactors using real-coded genetic algorithms

*Takahiro Takahashi, Kazuya Takahashi, Ken Kawamura, Tomohiro Hasebe, Taeka Inagaki, Yoshinori Ema

Author information

Keywords: evolutionary computing, chemical vapor deposition (CVD), growth rate, thin film

CONFERENCE PROCEEDINGS FREE ACCESS

Pages JP12

Details

Abstract

Fast and accurate calculation of the predicted results of Chemical Vapor Depositions (CVD) is very helpful to the R&D of the CVD processes. Therefore, we have developed a novel calculation method, by which accurate calculations along with reduced computing cost were achieved, to reproduce deposition profiles in a macroscopic cavity (macrocavity). Boundary value problems for estimating diffusion-reaction equations by iterations of numerical integrations were changed into problems of synthesizing a few basis functions and then finding the linear combinations consisted of the functions. We optimized the coefficients of the linear combinations by Real-Coded Genetic Algorithms (RCGA). We investigated three methods of RCGA, that is, BLX-alpha, REX, REX star. REX star showed the best performance with regard to both the cost and accuracy of the calculation.

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