Development and evaluation of an automatic experimental design system for chemical vapor depositions

Abstract

In order to automate the research and development process for chemical vapor deposition (CVD) processes, we developed an automatic experimental design system. The system proposed the optimal experimental conditions using the CMA-ES (Covariance Matrix Adaptation Evolution Strategy) algorithm for identifying the reaction mechanism (reaction model) that indicates the reaction paths both in a gas-phase and on a surface from the reactant (source gas) to the product (film). In addition, we evaluated the validity of the system using demonstrations by a synthetic CVD process.