Proceedings of Japanese Liquid Crystal Society Annual meeting
Online ISSN : 2432-5988
Print ISSN : 1880-3490
ISSN-L : 1880-3490
2000 Japanese Liquid Crystal Conference
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A Photo Alignment Technology using a Vertical Alignment Film
*Yoshihisa IwamotoYasuo TokoYasufumi Iimura
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CONFERENCE PROCEEDINGS FREE ACCESS

Pages 37-38

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Abstract
We have studied the dependence of the pretilt angle on the preparing conditions of a vertical alignment film and on NLC materials in a photo alignment, method. From this study, we showed that the high temperature baking of the alignment film and using a NLC material with large An are needed to create a low pretilt angle. And we succeeded in controlling the pretilt angle as low as 70 degrees without any alignment defects.
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© 2000 Japanese Liquid Crystal Society
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