Proceedings of Japanese Liquid Crystal Society Annual meeting
Online ISSN : 2432-5988
Print ISSN : 1880-3490
ISSN-L : 1880-3490
2004 Japanese Liquid Crystal Society annual meeting
Session ID : PB22
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Photopatterning of Mesoporous Silica Thin Films by Vacuum Ultraviolet Irradiation
*Satoshi KOJIMAAtsushi HOZUMIShusaku NAGANOTakahiro SEKI
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Abstract
Mesoporous silica (MPS) precursor films containing a polymer template were photochemically micropatterned by means of ultraviolet (VUV) irradiation. The resulting 10-m-width micropatterns consisted of MPS and MPS precursor regions. We further modified the latter surfaces using a fluoroalkylsilane. Due to this site-selective hydrophobization, rhodamine 6G molecules dissolved in water were successfully doped selectively into the irradiated MPS regions, as evidenced by absorption and fluorescence spectroscopy, and fluorescence microscope observation.
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© 2004 Japanese Liquid Crystal Society
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