Topological defect pattern engineering using the transition boundaries of nematics

Abstract

Herein this presentation, we demonstrate a simple method for large-scale patterning of topological defects in nematic liquid crystals. Our approach is based on dragging of defects formed at the frontier of the Iso-N transition by shear flow or by temperature gradient control. The fabricated large-scaled topological patterns are surprisingly stable and memorized through the surface anchoring. Topological polymeric films are also fabricated on the basis of the present technique.