Abstract
We prepared the TiO2 thin film electrodes for artificial photosynthesis by using the RF magnetronsputtering method. The TiO2 thin films deposited on MgO, LaAlO3, Al2O3, LaSrAlTaO and SrTiO3 single crystalsubstrates had an anatase, rutile and brookite crystal structures. We found that the crystal structure of TiO2 thinfilms depends on deposition conditions, such as total sputtering pressure, substrate materials and crystal planes ofsubstrate surface.
