IEEJ Transactions on Electronics, Information and Systems
Online ISSN : 1348-8155
Print ISSN : 0385-4221
ISSN-L : 0385-4221
Special Issue Review
Application and Perspective of Synchrotron Light-excited Process in Semiconductor Development
Tooru TanakaQixin GuoMitsuhiro NishioHiroshi OgawaTeruaki Motooka
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2007 Volume 127 Issue 2 Pages 126-132

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Abstract
Synchrotron light-excited process is one of the promising techniques for future semiconductor processes. In this report, we introduce several examples of the application of the synchrotron light-excited process on the semiconductor development, and focus especially on the growth and etching of II-VI compound semiconductor. In addition, the outline of a beamline for the development of advanced materials and processing at Saga Light Source is reported as a future perspective of the synchrotron light-excited process.
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© 2007 by the Institute of Electrical Engineers of Japan
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