Proposal of a Next Generation 3 Dimensional X-ray Lithography and Its Application to Fabrication of High Luminescence Optical Waveguide for Liquid Crystal Back Light Unit

Abstract

We have developed a new 3D x-ray lithography system for LIGA processing using synchrotron radiation at the NewSUBARU facility of the University of Hyogo. The x-ray lithography system can utilize two different energy regions; one is a high-energy region from 3 keV to 10 keV, and the other is a low-energy region from 0.1 to 2 keV. Each energy region can be selected in accordance with the size and shape of the desired microstructures. It is demonstrated that large-area high luminescence 7 inch optical waveguide for the liquid crystal back light unit was successfully fabricated using this x-ray lithography method.