Abstract
We describe the use of continuous-wave semiconductor diode laser beam as a heating source in thin film deposition system. One of the examples is heating of organic materials for sublimation to replace conventional Knudsen cell. The other is heating of the substrate to very high temperature (>1000°C) which can hardly be achieved by conventional resistive or lamp heaters. Many of the advantages come from the pin-point heating on demand that is enabled by the excellent directionality of high power laser beam.