IEEJ Transactions on Electronics, Information and Systems
Online ISSN : 1348-8155
Print ISSN : 0385-4221
ISSN-L : 0385-4221
<Electronic Devices>
Recent Developments of Spintronics Device Technologies Based on Magnetic Tunnel Junctions with Magnesium Oxide Tunnel Barrier
Shinji Yuasa
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2013 Volume 133 Issue 3 Pages 471-478

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Abstract
A magnetic tunnel junction (MTJ) consisting of a thin insulating layer (a tunnel barrier) sandwiched between two ferromagnetic electrodes exhibits the tunnel magnetoresistance (TMR) effect due to spin-dependent electron tunneling. Since the discovery of room-temperature TMR in the mid-1990s, MTJs with an amorphous aluminum oxide (Al-O) tunnel barrier have been studied extensively. Such MTJs exhibit a magnetoresistance (MR) ratio of several tens of percent at room temperature and have been applied to magnetoresistive random access memory (MRAM) and the read heads of hard disk drives. MTJs with MR ratios substantially higher than 100%, however, are desired for next-generation spintronic devices. In 2001, first-principle theories predicted that the MR ratios of epitaxial Fe/MgO/Fe MTJs with a crystalline MgO(001) barrier would be over 1000% due to the coherent tunneling of specific Bloch states. In 2004, MR ratios of about 200% were obtained for MgO-based MTJs. MTJs with a CoFeB/MgO/CoFeB structure were developed for practical application and found to have MR ratios of above 200% and other practical properties. This article reviews the physics of magnetoresistance in MTJs and the application of MTJs to various spintronic devices such as magnetic sensors, spin-transfer-torque MRAM with perpendicular magnetization, and novel microwave devices.
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© 2013 by the Institute of Electrical Engineers of Japan
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