Abstract
Recently organic thin films have been widely used as electrical and electronic elements, sensors, coatings, protectors, lithographic layers, etc. Among various methods for preparation of thin films, an evaporation technique under vacuum is one of the most simple and convenient methods. In this study we applied a new technique, ion-beam-assisted deposition, utilizing ion beam irradiation during the preparation of the organic thin films by evaporation.
As an example, conducting organic thin films of charge transfer complex have been prepared on porous oxide Al plates by means of evaporation under ion beam irradiation. A solid electrytic capacitor with a large capacitance per unit area and a good frequency response of impedance can be fabricated using organic thin films obtained with this method.
