International Journal of Automation Technology
Online ISSN : 1883-8022
Print ISSN : 1881-7629
ISSN-L : 1881-7629
Special Issue on Intelligent Measurement for Advanced Production Engineering
Re-Evaluation of Calibration and Measurement Capabilities of Pitch Calibration Systems Designed by Using the Diffraction Method
Ichiko MisumiJun-ichiro KittaRyosuke KizuAkiko Hirai
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JOURNAL OPEN ACCESS

2017 Volume 11 Issue 5 Pages 691-698

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Abstract

One-dimensional grating is one of the most important standards that are used to calibrate magnification of critical-dimension scanning electron microscopes (CD-SEMs) in the semiconductor industry. Long-term stability of pitch calibration systems is required for the competence of testing and calibration laboratories determined in ISO/IEC 17025:2005. In this study, calibration and measurement capabilities of two types of pitch calibration systems owned by a calibration laboratory are re-evaluated through comparison to a reference value and its expanded uncertainty given by a metrological atomic force microscope (metrological AFM) at National Metrology Institute of Japan (NMIJ), AIST. The calibration laboratory’s pitch calibration systems are designed by using the diffraction method (optical and X-ray).

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