Abstract
Metal-free phthalocyanine thin films were prepared by the vacuum deposition technique on the glass substrate. Effects of the preparation condition such as the deposition rate and the substrate temperature on the dark resistivity and the crystallization of this film are reported. The specific resistivity of this film is increased with the decrease of deposition rate in the range less than 300 Å/min and the increase of substrate temperature in the range heigher than 100°C. Measurements of Xray diffraction and transmission electron micrograph disclose the facts that the crystals of phthalocyanine are grown from the substrate with the monoclinic structure and increased in the grain size with the increase of the substrate temperature. It is concluded that this crystal growing is corresponding to the increase of resistivity of this film.
