Xerographic Properties of Annealed Poly (p-Phenylene Sulfide) Film in Oxygen

Abstract

Biaxially stretched poly(p-phenylene sulfide) (PPS) film showed high photosensitivity after being amealed in oxygen for 6 hours at a temperature between 270 and 285 °C. The spectral dependence of xerographic photosensitivity of the film had a peak at around 365 nm of UV region, and xerographic gain under 365 nm irradiation was 0.1 or above. The micro-Vickers hardness of PPS reached 60 kg/mm² after annealing at 280 °C for 6 h. The annealed film can be used for a hole-transporting meterial of layered photoreceptorby depositing a thin amorphous chalcogen alloy on the annealed PPS film or constituting the film on a hydrogenated amorphous silicon carbide film. The half-decay exposure of the annealed PPS with As₂Se₃ film was 0.5 lx⋅sec under white illumination. These experimental results demonstrate that the annealing of PPS film under an oxygen environment gives this film excellent photosensitivity and mechanical durability and hence, renders this material attractive for a xerographic application.