ITE Technical Report
Online ISSN : 2424-1970
Print ISSN : 1342-6893
ISSN-L : 1342-6893
23.1
Session ID : IDY99-30
Conference information
Fabrication of protective layer for AC-PDP by chemical solution deposition method
Yutaka HottaMakiko HayashiSumihito SagoTomoaki NakamuraWataru SakamotoToshinobu YogoShin-ichi Hirano
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CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract

In order to reduce the cost of AC-PDP, we studied tne fabrication process of the protective layer for AC-PDP by chemical solution deposition method. A stable MgO precursor solution was prepared from Mg-metal, 2-methoxyethanol, alcohol and organic additives. A MgO layer was prepared by spin coating using the precursor solution and firing at 500℃ in air. The MgO layer showed (111) plane orientation and high transmission coefficient (>95%). The measurement of discharge properties indicated that our MgO layer had the similar performance compared with electron beam evaporated one.

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© 1999 The Institute of Image Information and Television Engineers
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