Analysis of Triple Co alloy Layer Magnetic Thin Film with Different Bias Configuration
Details
Using substrate bias configuration, triple CoCrPt layer magnetic thin films were deposited by DC magnetron sputtering on CrV and glass substrate. Coercivity showed an increase for films with bias sputtered CoCrPt layer in which coercivity(H_C)was optimized for NB-B-NB type film deposited at higher temperature(300℃)(NB:no bias and B:bias applied in sputtering). Size reduction of the magnetic domains was observed by Magnetic Force Microscope. On the other hand, Secondary Ion Mass Spectroscopy study found no remarkable composition variance for Co and Cr element in depth scale. Crystal grain morphology and structure was studied by transmission electron microscope. Bias-sputtering-caused defects, slight composition changes and interfacial diffusion were discussed to explain the improvement of magnetic properties.
