Pulsed Filtered Vacuum Arc Deposition of ta-C Films
Details
Tetrahedral amorphous carbon (ta-C) films were prepared using a pulsed filtered vacuum arc deposition system at various substrate bias voltages. The Raman results confirmed that these ta-C films exhibited high sp^3 fraction of over 80%. The hardness, elastic modulus and compressive stress of the films were up to 47 GPa, 261 GPa and 17 GPa, respectively. The friction coefficient and wear rate of the films were as low as 〜0.085 and 4_x10^<-8> nm^3N^<-1>m^<-1>. The thermal stability of these films after vacuum annealing was also studied. The Raman results showed that the sp^3 fraction remained to be higher than 80% even after RTA at 900℃, meanwhile photoelasticity results showed that there was significant stress relaxation after annealing.
