Abstract
Photosensitive thin films were prepared by codeposition of polymerizable monomer and photoinitiator, which was patterned by UV irradiation followed by developing in an organic solvent. Formation of thin film patterns of carbazole polymer was achieved by this method. Similarly, photosensitive films were prepared by spin-coating a mixed solution of carbazole acrylate monomer and photoinitiator. Pattern formation was achieved when UV irradiation was made before the spin-coated film is completely dried to form polycrystalline thin films. However, the vapor-deposited films were superior in pattern formation and surface morphology. This technique was applied for the preparation of phosphorescent layer of an organic light emitting diode (OLED). It was found that the patterning process does not cause a harmful damage to the device characteristics, but rather improve the characteristics due to the polymerization.
