Precisely patterned zinc oxide (ZnO) thin film phosphor fabricated directly on glass substrate : after thin film fabrication with sputtering, wet etching, annealing

Abstract

The development of new and high efficient phosphor has been an important technology for the display industry. In order to overcome the remained problems of powder phosphor and lower the fabrication cost, we developed a novel technique for fabricating ZnO thin film phosphor on the glass substrate directly at the low temperature. This fabricated ZnO thin film phosphor has the promising features including higher coherency, uniformity, flatness regarding to the disadvantage of the power phosphor. Particularly, the ZnO thin film phosphor, showing high luminance of blue-green, was easily and precisely patterned on large area (φ100mm) by wet etching method.