Journal of The Japan Society of Microgravity Application
Print ISSN : 0915-3616
Technological Development of highly accurate Diffusion Coefficient Measurement by Shear Cell Method in Germanium Semiconductor Melt
Shin-ichi YODAHirohisa ODATomihisa NAKAMURATadahiko MASAKINaokiyo KOSHIKAWASatoshi MATSUMOTOAkira TANJIMinoru KANEKOYoshito ARAIKazumasa GOTONatsumi TATEIWA
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JOURNAL OPEN ACCESS

1997 Volume 14 Issue 4 Pages 331-

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Abstract

Shear Cell method is one of diffusion coefficient measuring method, and this method can make it possible to measure Diffusion coefficient accurately. Development of Shear Cell method was performed in this investigation. Preliminary investigation as fluid simulation was performed to decide best design for Shear Cell cartridge. Diffusion coefficient of germanium semiconductor melt was measured in microgravity environment using this Shear Cell cartridge. Experiment temperature is 1200°C, experiment time is 357 sec. These experiment conditions are decided to utilize microgravity environment in sounding rocket fully. Concentration distribution of experiment sample is measured by SIMS after flight experiment. Diffusion coefficient is calculated as 1.94 X 10-4 cm2 / s from this results. Technological development of Shear Cell method was achieved from this experiment.

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© 1997 The Japan Society of Microgravity Application
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