JOURNAL OF CHEMICAL ENGINEERING OF JAPAN
Online ISSN : 1881-1299
Print ISSN : 0021-9592
Separation Engineering
Stability of H2-Permeselective Ni-doped Silica Membranes in Steam at High Temperature
Masakoto KanezashiMasashi Asaeda
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2005 Volume 38 Issue 11 Pages 908-912

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Abstract
Ni-doped silica membranes of various Ni contents (Si/Ni = 0–1/1) were prepared on porous SiO2–ZrO2 composite intermediate layers (Si/Zr = 1/1) by the sol-gel techniques to test their hydrothermal stability and gas permeation characteristics in steam at high temperatures (steam: 90–400 kPa, 500°C). Preceding firing of the intermediate layer and the Ni-doped silica layer in steam at higher temperatures (steam: 90 kPa, 650°C) before exposed to hydrogen at high temperatures was found to drastically improve the hydrothermal stability of Ni-doped silica membranes in steam, showing, for example, a steady permeance of He around 1.7 × 10–5 [m3(STP)·m–2·s–1·kPa–1] with high selectivity of 1150 (He/N2) in steam (steam: 90 kPa, 500°C), which did not change largely even in steam of higher pressure (steam: 400 kPa, 500°C). It was also found that the membrane selectivity could be further improved with negligible decrease in H2-permeance by firing the membranes after impregnating dilute aqueous NiNO3 solution.
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© 2005 The Society of Chemical Engineers, Japan
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