High-Speed Deposition of Yttria-Stabilized Zirconia and Titania Films by Laser Chemical Vapor Deposition

(Paper)

Abstract

Yttria-stabilized zirconia (YSZ, Zr_1-xY_xO_2-x/2) and titania (TiO₂) films were prepared by laser chemical vapor deposition (LCVD). The deposition rate increased drastically by laser irradiation, and reached to 660 μm/h for YSZ and 2300 μm/h for TiO₂ films. The increase of the deposition rate was resulted from plasma formation around the deposition zone, and the plasma was formed at high laser power and high substrate pre-heating temperature. Various morphologies of films such as feather-like columnar structure and dense microstructure were obtained depending on deposition conditions. The columnar structure contained a large amount of nano-pores at columnar boundary and in grains.