Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process at Room Temperature

Abstract

Dense yttrium oxide film was prepared by aerosol deposition process at room temperature. The deposition rate was very high ~60 μm/h. The thickness of the films were 25 μm and 10 μm on aluminum alloy and quartz substrates, respectively. Transmission electron microscopy showed that the film was highly dense without voids and had a homogeneous interface between the layer and the quartz substrate used. The film was composed of randomly oriented Y₂O₃ crystallites of size less than 20 nm. The film (2 μm thick) had a 55-85% transmittance in the region 250-800 nm. Electrical and mechanical properties of the film were examined. The volume resistivity of the film was 10¹⁴ Ω•cm. The adhesion force of the interface between the Y₂O₃ layer and the substrate was 59 MPa.