Abstract
A new principle of chemical vapor deposition for high-speed film growth is presented by incorporating the thermophoretic precipitation of ultrafine particles produced in the gas phase. This new CVD method, as named PPCVD (Particle-Precipitation Aided Chemical Vapor Deposition), has been successfully applied to the preparation of TiO2 films on a glass substrate by thermal decomposition of titanium-tetraisopropoxide (Ti(OC3H7)4, TTIP). The TiO2 films are amorphous and oriented anatase crystallites for the substrate temperature lower than 623 and higher than 723K, respectively. The growth rate is 40nm/s, which is 1 to 2 orders of magnitude greater than the conventional CVD process.
