Electrophoretic Deposition and the Deposition Mechanism of Tl-2223 Superconducting Powder

Abstract

The Preparation of a Tl-2223 superconductor coating using the electrophoretic deposition method, the preparation conditions of the electrophoretic deposition coating and the deposition mechanism have been investigated. The maximum amount of the deposit was obtained when 1.5mg I₂ and 0.2g superconducting powder were added to the 10ml cyclohexanone bath, and a uniform coating was obtained with an applied voltage under 300V. The electrification mechanism of the particles in the deposition bath revealed that H⁺ ion was produced in the I₂-added cyclohexanone bath after which H⁺ ion was adsorbed on to the particle surface. The maximum zeta potential of the particle was 92mV when 1.0mg I₂ was added to the 10ml cyclohexanone bath. The deposition current density was proportional to the inverse of the square root of the deposition time (t^-1/2) and the amount of the deposit was proportional to the square root of the deposition time (t^1/2) during the formation of the particle layer by electrophoretic deposition. Accordingly, the diffusion of H⁺ ions through a small opening in the oxide layer was considered to be a diffusion controlled process for the electrode reaction during the electrophoretic deposition.