Abstract
Interface reactions for TiAl/Al2O3 and TiAl/TiO2 have been investigated by the present study and the reaction for Ti/Al2O3 and the oxidation reaction of TiAl obtained from the literatures have been analyzed by the use of chemical potential diagram of Ti-Al-O system, The layer sequences for these interface reactions are summarized as follows.
(1) TiAl/Al2O3 at 1273K: No essential reaction occurred.
(2) TiAl/Al2O3 at 1373K; TiAl(O)/Ti3Al(O)/Al2O3
(3) Ti/Al2O3 at 1373K for a thick sample by Choi et al.: Ti/Ti3Al(O)/TiAl(O)/Al2O3
(4) Ti/Al2O3 at 1373K for a thin sample by Choi et al.: Ti2O/Ti3Al(O)/Al2O3
(5) Ti/Al2O3 at 1273K by Hatakeyama et al.: Ti/Ti3Al(O)/TiAl(O)/Al2O3
(6) Oxidation of Ti-42at% Al at 1273K by Hatakeyama et al.: TiAl/Al2O3/Al2O3+TiO2/TiO2
(7) Oxidation of Ti-36.3at% Al at 1173K by Shida and Anada: TiAl/Ti3Al(O)/Al2O3+TiO2/Al2O3/TiO2
These reaction paths have been reasonably elucidated by the use of chemical potential diagram of Ti-Al-O system, which was constructed using the data of Gibbs energy of formation of the compounds composed of Ti, Al and O.