Effects of Hydrothermal Treatment on Firing Process of Silicon Nitride Containing Y2O3-Nd2O3 Additive

Fumio MUNAKATA; Chikai SATOU; Yoshio AKIMUNE; Makoto TANIMURA; Naoto HIROSAKI; Yasuhide INOUE

doi:10.2109/jcersj.106.208

Effects of Hydrothermal Treatment on Firing Process of Silicon Nitride Containing Y₂O₃-Nd₂O₃ Additive

Fumio MUNAKATA, Chikai SATOU, Yoshio AKIMUNE, Makoto TANIMURA, Naoto HIROSAKI, Yasuhide INOUE

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Keywords: β-Si₃N₄, Y₂O₃-Nd₂O₃, Hydrothermal treatment, TEM, EDX

JOURNAL FREE ACCESS

1998 Volume 106 Issue 1230 Pages 208-212

DOI https://doi.org/10.2109/jcersj.106.208

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Abstract

The firing behavior of β-Si₃N₄ powder corroded under hydrothermal conditions was investigated by transmission electron microscopy (TEM) and energy dispersive X-ray spectroscopy (EDX). TEM and EDX analyses suggested that the hydrothermal treatment enhanced the formation of transient growth bands in β-Si₃N₄ ceramics containing Y₂O₃-Nd₂O₃ additive during firing at high temperature. Also, EDX analysis indicated that the grain boundary regions around the grown β-Si₃N₄ grains contained a Y-Nd-Si-O-N phase.

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